Semua produk
kata kunci [ plasma surface treatment machine ] pertandingan 37 Produk.
Mesin Pengolahan Permukaan Plasma Uap Air 500W Peralatan Polishing Kuarsa
| Sumber daya listrik: | 220V/50Hz |
|---|---|
| Suhu Perawatan Plasma: | Suhu Kamar |
| Bahan Ruang Plasma: | Kuarsa |
Mesin Perawatan Permukaan Plasma Industri 220V / 50Hz Dengan Generator RF Sumber Plasma
| Suhu Perawatan Plasma: | Suhu Kamar |
|---|---|
| Konsumsi Daya: | 500KW |
| Keseragaman Perawatan Plasma: | ± 5% |
PLC Control Quartz Plasma Surface Treatment Machine 220V Peralatan Polishing Plasma
| Model: | PP001 |
|---|---|
| Waktu Perawatan Plasma: | 3-5 menit |
| Sumber daya listrik: | 220V/50Hz |
Sistem Finishing Plasma Presisi Tinggi Dengan Mesin Pemurnian Permukaan Kamar Kuarsa
| Konsumsi Daya: | 500W |
|---|---|
| Tekanan Perawatan Plasma: | 0,1-1,0 Pa |
| Keseragaman Perawatan Plasma: | ± 5% |
Suhu kamar Plasma Polisher 500W Plasma Perawatan Mesin Konsumsi energi rendah
| Bahan Ruang Plasma: | Kuarsa |
|---|---|
| Gas plasma: | Argon |
| Suhu Perawatan Plasma: | Suhu Kamar |
RF Generator Plasma Polishing Machine 220V Mesin Polishing Permukaan Logam ISO9001
| Tekanan Perawatan Plasma: | 0,1-1,0 Pa |
|---|---|
| Ukuran Ruang Plasma: | 300mm X 300mm X 300mm |
| Sumber plasma: | Generator RF |
Uap air besar Plasma Polishing Machine 220V Metal Surface Polishing Machine
| Gas plasma: | uap air |
|---|---|
| Sumber daya listrik: | 220V/50Hz |
| Konsumsi Daya: | 500KW |
Quartz PLC Control Plasma Treatment Machine 220V / 50Hz Peralatan Penghalusan Plasma
| Sistem kontrol: | Kontrol plc layar sentuh |
|---|---|
| Sumber daya listrik: | 220V/50Hz |
| Bahan Ruang Plasma: | Kuarsa |
Mesin Pengolahan Plasma suhu kamar 220V / 50Hz Quartz Gas Phase Polishing Device
| Suhu Perawatan Plasma: | Suhu Kamar |
|---|---|
| Bahan Ruang Plasma: | Kuarsa |
| Sumber daya listrik: | 220V/50Hz |
500KW Plasma Polishing Machine Mesin pemurnian permukaan suhu kamar
| Laju aliran gas: | 0-100 Scm |
|---|---|
| Tekanan Perawatan Plasma: | 0,1-1,0 Pa |
| Keseragaman Perawatan Plasma: | ± 5% |


